3D Micro-nano Topography Measuring

The 3D micro-nano structure topography measuring system is based on the principle of white light interference scanning, take the wavelength of light as the measurement benchmark, use the nano-level high-precision scanning system combined with the high-precision analytical algorithm with independent intellectual property rights, to achieve continuous or step mutation micro-nano structure surface Three-dimensional topography reconstruction, thereby obtaining the measurement results of various appearance parameters such as the three-dimensional topography, surface texture, and microscopic size of the object to be measured.

Characteristics:

  1. Very high measurement accuracy: Based on the principle of interferometry, the measurement repeatability reaches 1nm.
  2. Large measurement range: Using a unique scanning system, the single-field scanning range can reach 10mm while ensuring nano-positioning accuracy. Combined with the white light source reconstruction method, it can meet the measurement needs of large-scale objects such as curved components.
  3. Fully automatic measurement: The automatic focus detection function is standard, combined with the automatic focus adjustment device, no complex adjustment process is required, and the entire process of focus adjustment and detection can be completed with one key operation. The optional automatic 2D platform can automatically complete the large-area 3D data stitching operation.
  4. High integration and easy installation: the whole machine is integrated into a unified whole, only need to connect 220v power supply, and data transmission and measurement can be completed through USB3.0 data transmission.
  5. High cost performance: Adopt patented technology to ensure system performance and reduce manufacturing costs.
  6. High flexibility: With independent intellectual property rights, the system can be improved according to user needs to meet the needs of different industrial application scenarios.

Specification:

Model 3DNM-W50
Light source LED
CCD resolution 2040 × 1080
Focus method Automatic
Vertical scanning range 4mm
Vertical scanning speed 15μm/s
Tilt adjustment range
Vertical resolution VSI:0.5nm,PSI:0.1nm
Horizontal resolution 650nm(20x objective lens)
Profiler Measurement repeatability 1nm
XY sampling stage mapping 100mm×100mm(Manual)
Z-axis mapping 50mm(Automatic)
Weight 50Kg
Systems measurement 550mm × 380mm × 680mm
Data transfer interface USB 3.0

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