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勻膠、顯影處理系統-Auto Track
勻膠、顯影處理系統-Auto Track
Categories:
Wafer Fabrication
,
Wafer/Photomask & Substrate Cleaning Systems
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General Details
產品視頻
產品特點:
同一設備實現2″-8″晶圓兼容.
塗膠、顯影模塊自帶暫停/恢復功能.
同片盒內每個矽片可分別制定工藝運行.
乾濕分離,電液分隔.
維護省力、簡便.
設備和各工位全封閉設計,不受外環境干擾可獨立增加層流罩,提升小環境潔淨度.
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